Quantum-based oscillators, sensors, and timing systems for next-generation precision measurement.
Acetone 99.9% LM (Low Metal) from Transene is a high-purity, electronic-grade solvent with extremely low impurities (max 5000 ppb residue, low trace metals). It is designed for sensitive cleaning, surface preparation, and degreasing applications in microelectronics, cleanroom environments, and laboratory settings.
Ammonium Fluoride 40% LM (Low Metal) is a high-purity, aqueous chemical solution NH4F primarily used for precision etching and cleaning in the semiconductor industry. This colorless, odorless liquid typically contains \(40-41\%\) ammonium fluoride and offers extremely low trace metal concentrations (often in the ppb range), making it ideal for specialized electronic applications.
Transene's Isopropanol LM (Low Metal) is a high-purity (typically >99.5%) grade of Isopropyl Alcohol (IPA) specially designed for electronics, semiconductor, and laboratory applications where metal contamination must be minimized.
Transene Sulfuric Acid 96% LM is a high-purity, Low Metals (LM) electronic grade acid H2SO4 typically used in semiconductor manufacturing, microelectronics, and advanced laboratory applications for cleaning, etching, and removing organic contaminants.
Transene Methanol 99.9% LM is a high-purity (99.9% min), electronic grade, or low-moisture (LM) solvent designed for precision applications. This solvent is primarily used in the semiconductor and electronics industries for cleaning, processing, or as a solvent in demanding laboratory, HPLC, or analytical applications.
Transene offers specialized, high-purity, ready-to-use wet chemical etchants for nickel (Ni), specifically designed for electronics, thin-film circuits, and semiconductor applications. Key products include Nickel Etchant TFB and TFG, which are nitrate-based and optimized for precise, uniform, and clean etching of evaporated or electroless nickel, often used between gold and chromium layers.
Transene Aluminum Etchants are stable, non-toxic preparations used to etch aluminum metallizations on silicon devices and in integrated circuit applications. Aluminum contacts are defined, and interconnections are formed. These Aluminum Etchants, formulated with unique properties, easily overcome many of the difficulties experienced in aluminum etch processes.
Transene Company, Inc. offers a Potassium Hydroxide (KOH) 45% solution, likely corresponding to their "LM" or "Semi" product grades, which are used in semiconductor and microelectronics applications.